TSMC To Recieve ASML’s High-NA EUV Equipment By The End Of This Year, Costing a Whopping $350 Million

Taiwan giant TSMC will receive the first batch of high-NA EUV lithography equipment from ASML by the end of 2024, marking the transition to next-gen processes. TSMC Decides To Switch Towards High-NA Equipment Amid Market Competition, Will Likely Utilize It With A14 & Ahead Processes The utilization of high-NA equipment is now seen as...